A virtual metrology approach for maintenance compensation to improve yield in semiconductor manufacturing
Process condition was changed by preventative maintenance that may lead to the inconsistency of process output. In practice, process engineers have difficulties to discover the inconsistency that the defect wafer may have been produced before the next measurement. This study proposes a virtual metro...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
Atlantis Press
2014-07-01
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| Series: | International Journal of Computational Intelligence Systems |
| Subjects: | |
| Online Access: | https://www.atlantis-press.com/article/25868571.pdf |