Morphological analysis of the TiN thin film deposited by CCPN technique

Morphological analysis of the TiN thin film deposited by CCPN technique

TiN granular thin films were deposited on SiO2 substrates using cathodic cage plasma nitriding (CCPN) and SEM images, roughness analysis, contact angle measurements, and X-ray diffraction (XRD) were employed to characterize the structure of these films varying time and temperature of the process. Re...

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Bibliographic Details
Main Authors: Heurison de Sousa e Silva, Fernanda Roberta Marciano, Alan Silva de Menezes, Thercio Henrique de Carvalho Costa, Larissa Solano de Almeida, Luciana Sgarbi Rossino, Igor Oliveira Nascimento, Rômulo Ribeiro Magalhães de Sousa, Bartolomeu Cruz Viana
Format: Article
Language:English
Published: Elsevier 2020-11-01
Series:Journal of Materials Research and Technology
Subjects:
TiN
Cathodic cage
Contact angle
Film roughness.
Online Access:http://www.sciencedirect.com/science/article/pii/S2238785420318044

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http://www.sciencedirect.com/science/article/pii/S2238785420318044

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