Pattern Formation upon Evaporation of Sessile Droplets of Polyelectrolyte/Surfactant Mixtures on Silicon Wafers

Pattern Formation upon Evaporation of Sessile Droplets of Polyelectrolyte/Surfactant Mixtures on Silicon Wafers

The formation of coffee-ring deposits upon evaporation of sessile droplets containing mixtures of poly(diallyldimethylammonium chloride) (PDADMAC) and two different anionic surfactants were studied. This process is driven by the Marangoni stresses resulting from the formation of surface-active polye...

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Bibliographic Details
Main Authors: Lionel Perrin, Andrew Akanno, Eduardo Guzman, Francisco Ortega, Ramon G. Rubio
Format: Article
Language:English
Published: MDPI AG 2021-07-01
Series:International Journal of Molecular Sciences
Subjects:
evaporation
salt
surfactant
sessile droplet
patterning
Marangoni flow
Online Access:https://www.mdpi.com/1422-0067/22/15/7953

Internet

https://www.mdpi.com/1422-0067/22/15/7953

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