Adhesion–delamination phenomena at the interfaces of the dielectric layer

Fan-out wafer-level packaging (FOWLP) has been developed as an enhancement of standard wafer-level packaging solutions and is being intensively researched nowadays. However, issues of delamination remain unsolved. This study focuses on the interfacial characteristics between polyimide (PI) and redis...

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Bibliographic Details
Main Authors: C.T. Pan, C.N. Wu, S.W. Mao, S.Y. Wang, S.P. Ju, J.D. Wu, C.K. Yen, W.F. Chen
Format: Article
Language:English
Published: Elsevier 2020-09-01
Series:Results in Physics
Subjects:
AFM
XPS
Online Access:http://www.sciencedirect.com/science/article/pii/S2211379720317162