Process study and the lithographic performance of commercially available silsesquioxane based electron sensitive resist Medusa 82

Process study and the lithographic performance of commercially available silsesquioxane based electron sensitive resist Medusa 82

In the past 2 decades silsesquioxane has gained attention in the Electron Beam Lithography community as a negative tone electron-sensitive resist (HSQ) whose advantages (sub-20 nm resolution, high contrast, low Line Edge Roughness, good shape fidelity and high etch resistance) outnumber its associat...

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Bibliographic Details
Main Authors: Th. Mpatzaka, G. Zisis, I. Raptis, V. Vamvakas, C. Kaiser, T. Mai, M. Schirmer, M. Gerngroß, G. Papageorgiou
Format: Article
Language:English
Published: Elsevier 2020-08-01
Series:Micro and Nano Engineering
Subjects:
Electron beam lithography
Silsesquioxane
Negative tone electron-sensitive resists
Resist processing
Resist contrast
Nanostructures
Online Access:http://www.sciencedirect.com/science/article/pii/S2590007220300204

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http://www.sciencedirect.com/science/article/pii/S2590007220300204

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