Process study and the lithographic performance of commercially available silsesquioxane based electron sensitive resist Medusa 82
In the past 2 decades silsesquioxane has gained attention in the Electron Beam Lithography community as a negative tone electron-sensitive resist (HSQ) whose advantages (sub-20 nm resolution, high contrast, low Line Edge Roughness, good shape fidelity and high etch resistance) outnumber its associat...
Main Authors: | , , , , , , , , |
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Format: | Article |
Language: | English |
Published: |
Elsevier
2020-08-01
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Series: | Micro and Nano Engineering |
Subjects: | |
Online Access: | http://www.sciencedirect.com/science/article/pii/S2590007220300204 |