Metal-assisted chemical etching using sputtered gold: a simple route to black silicon
We report an accessible and simple method of producing 'black silicon' with aspect ratios as high as 8 using common laboratory equipment. Gold was sputtered to a thickness of 8 nm using a low-vacuum sputter coater. The structures were etched into silicon substrates using an aqueous H2O2/HF...
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| Format: | Article |
| Language: | English |
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Taylor & Francis Group
2011-01-01
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| Series: | Science and Technology of Advanced Materials |
| Online Access: | http://iopscience.iop.org/1468-6996/12/4/045001 |