Sputter-Deposited-MoS<sub>2</sub> <inline-formula> <tex-math notation="LaTeX">${n}$ </tex-math></inline-formula>MISFETs With Top-Gate and Al<sub>2</sub>O<sub>3</sub> Passivation Under Low Thermal Budget for Large Area Integration

We have fabricated large area integrated top-gate <inline-formula> <tex-math notation="LaTeX">${n}$ </tex-math></inline-formula>MISFETs with sputter-deposited-MoS<sub>2</sub> film having n-type operation. A sputtering method enables us to form a large-ar...

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Bibliographic Details
Main Authors: Kentaro Matsuura, Jun'Ichi Shimizu, Mayato Toyama, Takumi Ohashi, Iriya Muneta, Seiya Ishihara, Kuniyuki Kakushima, Kazuo Tsutsui, Atsushi Ogura, Hitoshi Wakabayashi
Format: Article
Language:English
Published: IEEE 2018-01-01
Series:IEEE Journal of the Electron Devices Society
Subjects:
Online Access:https://ieeexplore.ieee.org/document/8543583/