Structural Study of Thin Amorphous SiO2 and Si3N4 Films by the Grazing Incidence X-Ray Scattering (GIXS) Method

Bibliographic Details
Main Authors: Sato, Shigeo, Kakiuchi, Ryoji, Yoshiya, Masato, Matsubara, Eiichiro, Saito, Masatoshi, Waseda, Yoshio, Takayama, Shinji
Format: Article
Language:English
Published: De Gruyter 1999-01-01
Series:High Temperature Materials and Processes
Online Access:https://doi.org/10.1515/HTMP.1999.18.1-2.99