One-Step Mask-Based Diffraction Lithography for the Fabrication of 3D Suspended Structures
Abstract We propose a novel one-step exposure method for fabricating three-dimensional (3D) suspended structures, utilizing the diffraction of mask patterns with small line width. An optical model of the exposure process is built, and the 3D light intensity distribution in the photoresist is calcula...
Main Authors: | , , , , , |
---|---|
Format: | Article |
Language: | English |
Published: |
SpringerOpen
2018-12-01
|
Series: | Nanoscale Research Letters |
Subjects: | |
Online Access: | http://link.springer.com/article/10.1186/s11671-018-2817-6 |