Characterization of SiO<sub>2</sub>/4H-SiC Interfaces in 4H-SiC MOSFETs: A Review
This paper gives an overview on some state-of-the-art characterization methods of SiO<sub>2</sub>/4H-SiC interfaces in metal oxide semiconductor field effect transistors (MOSFETs). In particular, the work compares the benefits and drawbacks of different techniques to assess the physical...
Main Authors: | , , |
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Format: | Article |
Language: | English |
Published: |
MDPI AG
2019-06-01
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Series: | Energies |
Subjects: | |
Online Access: | https://www.mdpi.com/1996-1073/12/12/2310 |