High-throughput top-down fabrication of uniform magnetic particles.

High-throughput top-down fabrication of uniform magnetic particles.

Ion Beam Aperture Array Lithography was applied to top-down fabrication of large dense (10(8)-10(9) particles/cm(2)) arrays of uniform micron-scale particles at rates hundreds of times faster than electron beam lithography. In this process, a large array of helium ion beamlets is formed when a stenc...

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Bibliographic Details
Main Authors: Julia Litvinov, Azeem Nasrullah, Timothy Sherlock, Yi-Ju Wang, Paul Ruchhoeft, Richard C Willson
Format: Article
Language:English
Published: Public Library of Science (PLoS) 2012-01-01
Series:PLoS ONE
Online Access:http://europepmc.org/articles/PMC3365077?pdf=render

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http://europepmc.org/articles/PMC3365077?pdf=render

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