Thermal resistances of crystalline and amorphous few-layer oxide thin films

Thermal insulation at nanoscale is of crucial importance for non-volatile memory devices such as phase change memory and memristors. We perform non-equilibrium molecular dynamics simulations to study the effects of interface materials and structures on thermal transport across the few-layer dielectr...

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Bibliographic Details
Main Authors: Liang Chen, Niru Kumari, Yu Hou
Format: Article
Language:English
Published: AIP Publishing LLC 2017-11-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/1.5007299