Refractive Index Profile in Photorefractive-Damage-Resistant Near-Stoichiometric Ti:Mg:Er: <formula formulatype="inline"><tex Notation="TeX">$\hbox{LiNbO}_{3}$</tex></formula> Strip Waveguide

Refractive Index Profile in Photorefractive-Damage-Resistant Near-Stoichiometric Ti:Mg:Er: <formula formulatype="inline"><tex Notation="TeX">$\hbox{LiNbO}_{3}$</tex></formula> Strip Waveguide

Refractive index profile in photorefractive-damage-resistant near-stoichiometric (NS) single-mode Ti:Mg:Er: <formula formulatype="inline"><tex Notation="TeX">$\hbox{LiNbO}_{3}$</tex></formula> strip waveguide is constructed from the measured mode field dis...

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Bibliographic Details
Main Authors: Shi-Yu Xu, Bei Chen, Ping-Rang Hua, Dao-Yin Yu, Edwin Yue-Bun Pun, De-Long Zhang
Format: Article
Language:English
Published: IEEE 2012-01-01
Series:IEEE Photonics Journal
Subjects:
Near-stoichiometric (NS) Ti:Mg:Er:<formula formulatype="inline"><tex Notation="TeX">$\hbox{LiNbO}_{3}$</tex> </formula> waveguide
refractive index profile
mode field distribution
variational method
Online Access:https://ieeexplore.ieee.org/document/6297432/

Internet

https://ieeexplore.ieee.org/document/6297432/

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