Towards Scalable Large-Area Pulsed Laser Deposition

Towards Scalable Large-Area Pulsed Laser Deposition

One of the significant limitations of the pulsed laser deposition method in the mass-production-technologies of micro- and nanoelectronic and molecular device electronic fabrication is the issue of ensuring deposition of films with uniform thickness on substrates with large diameter (more than 100 m...

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Bibliographic Details
Main Authors: Zakhar Vakulov, Daniil Khakhulin, Evgeny Zamburg, Alexander Mikhaylichenko, Vladimir A. Smirnov, Roman Tominov, Viktor S. Klimin, Oleg A. Ageev
Format: Article
Language:English
Published: MDPI AG 2021-08-01
Series:Materials
Subjects:
pulsed laser deposition
nanomaterials
computer simulation
thin films
large-area deposition
metal oxides
Online Access:https://www.mdpi.com/1996-1944/14/17/4854

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https://www.mdpi.com/1996-1944/14/17/4854

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