Investigation of Polishing Pads Impregnated with Fe and Al2O3 Particles for Single-Crystal Silicon Carbide Wafers

This study focuses on the development of a novel polishing pad for SiC wafers. Fe and Al2O3 particles were impregnated in a polyurethane matrix, thus forming a fixed abrasive polishing pad. Four types of pads with different compositions of Fe and Al2O3 were fabricated. A combination of loose and fix...

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Bibliographic Details
Main Authors: Jihng-Kuo Ho, Chih-Yung Huang, Ming-Yi Tsai, Che-Cheng Tsai
Format: Article
Language:English
Published: MDPI AG 2016-03-01
Series:Applied Sciences
Subjects:
Online Access:http://www.mdpi.com/2076-3417/6/3/89