Photomasks Fabrication Based on Optical Reduction for Microfluidic Applications
A procedure for fabrication of photomasks on photographic films with minimum feature achievable of about 20 μm, which are particularly suitable for the fast prototyping of microfluidic devices, has been improved. We used a commercial photographic enlarger in reverse mode obtaining 10:1 reduction fac...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2013-05-01
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| Series: | Micromachines |
| Subjects: | |
| Online Access: | http://www.mdpi.com/2072-666X/4/2/206 |