Increased sensitivity in near infrared hyperspectral imaging by enhanced background noise subtraction
Near infrared hyperspectral photoluminescence imaging of crystalline silicon wafers can reveal new knowledge on the spatial distribution and the spectral response of radiative recombination active defects in the material. The hyperspectral camera applied for this imaging technique is subject to back...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
IM Publications Open
2019-01-01
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| Series: | Journal of Spectral Imaging |
| Subjects: | |
| Online Access: | https://www.impopen.com/download.php?code=I08_a2 |