Influence of ion implantation on the charge storage mechanism of vanadium nitride pseudocapacitive thin films
The influence of microstructural or structural defects is seldom investigated in pseudocapacitive electrodes. Indeed, most of the synthesized materials do present defects at every scales which contribute to the improvement of the charge storage. In this study VN thin films were deposited by reactive...
| Main Authors: | , , , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Elsevier
2021-04-01
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| Series: | Electrochemistry Communications |
| Subjects: | |
| Online Access: | http://www.sciencedirect.com/science/article/pii/S1388248121001004 |