Deconvoluted Si 2p Photoelectron Spectra of Ultra thin SiO2 film with FitXPS method
The main impetus for our research is provided by the growing interest worldwide in ultra thin silicon dioxide on silicon based nano devices. The obvious need for better knowledge in the ultra thin gate silicon dioxides, is motivated both by interests in fundamental research and phenomenology as well...
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| Format: | Article |
| Language: | English |
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Nanoscience and Nanotechnology Research Center, University of Kashan
2011-01-01
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| Series: | Journal of Nanostructures |
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| Online Access: | http://jns.kashanu.ac.ir/article_5245_445040d0c230f977596b0974b764cacc.pdf |