Analysis of a Thermal Plasma Diamond CVD System
This paper deals with the analysis of a typical engineering system utilizing thermal plasma - a system for Diamond Chemical Vapor Deposition. It defines the system - a slightly overexpanded plasma jet impinging at a downstream -located substrate, outlines the theoretical description of the system -...
| Main Author: | |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
CTU Central Library
2001-01-01
|
| Series: | Acta Polytechnica |
| Subjects: | |
| Online Access: | https://ojs.cvut.cz/ojs/index.php/ap/article/view/250 |