Analysis of a Thermal Plasma Diamond CVD System
This paper deals with the analysis of a typical engineering system utilizing thermal plasma - a system for Diamond Chemical Vapor Deposition. It defines the system - a slightly overexpanded plasma jet impinging at a downstream -located substrate, outlines the theoretical description of the system -...
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| Format: | Article |
| Language: | English |
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CTU Central Library
2001-01-01
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| Series: | Acta Polytechnica |
| Subjects: | |
| Online Access: | https://ojs.cvut.cz/ojs/index.php/ap/article/view/250 |
| Summary: | This paper deals with the analysis of a typical engineering system utilizing thermal plasma - a system for Diamond Chemical Vapor Deposition. It defines the system - a slightly overexpanded plasma jet impinging at a downstream -located substrate, outlines the theoretical description of the system - the Navier-Stokes and species conservation equations, and presents key theoretical results on the major and most troublesome factors influencing diamond deposition - velocity and temperature of the jet. Then, the paper demostrates the necessity to shift from a laminar to a turbulent flow description and compares both results to experiments. An explanation of the remaining discrepancy - insufficient velocity drop in the jet - is attempted. |
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| ISSN: | 1210-2709 1805-2363 |