Investigation of a Simplified Mechanism Model for Prediction of Gallium Nitride Thin Film Growth through Numerical Analysis

A numerical procedure was performed to simplify the complicated mechanism of an epitaxial thin-film growth process. In this study, three numerical mechanism models are presented for verifying the growth rate of the gallium nitride (GaN) mechanism. The mechanism models were developed through rate of...

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Bibliographic Details
Main Authors: Chih-Kai Hu, Chun-Jung Chen, Ta-Chin Wei, Tomi T. Li, Ching-Chiun Wang, Chih-Yung Huang
Format: Article
Language:English
Published: MDPI AG 2017-03-01
Series:Coatings
Subjects:
GaN
Online Access:http://www.mdpi.com/2079-6412/7/3/43