2.3 kV 4H-SiC Accumulation-Channel Split-Gate Planar Power MOSFETs With Reduced Gate Charge
2.3 kV 4H-SiC split-gate (SG) planar accumulation-channel power MOSFETs have been successfully manufactured in a 6 inch commercial foundry with good parametric distributions. The measured electrical characteristics of these devices are compared with conventional ACCUFETs manufactured with the same c...
Main Authors: | Aditi Agarwal, Kijeong Han, B. Jayant Baliga |
---|---|
Format: | Article |
Language: | English |
Published: |
IEEE
2020-01-01
|
Series: | IEEE Journal of the Electron Devices Society |
Subjects: | |
Online Access: | https://ieeexplore.ieee.org/document/9081981/ |
Similar Items
-
SiC Planar MOSFETs With Built-In Reverse MOS-Channel Diode for Enhanced Performance
by: Xintian Zhou, et al.
Published: (2020-01-01) -
2.3 kV 4H-SiC Planar-Gate Accumulation Channel Power JBSFETs: Analysis of Experimental Data
by: Aditi Agarwal, et al.
Published: (2021-01-01) -
Radiation Response of Negative Gate Biased SiC MOSFETs
by: Akinori Takeyama, et al.
Published: (2019-08-01) -
Investigating the Shielding Effect of Pulse Transformer Operation in Isolated Gate Drivers for SiC MOSFETs
by: Loreine Makki, et al.
Published: (2021-06-01) -
SiC oxidation processing technology for MOSFETs fabrication
by: Constant, Aurore
Published: (2011)