Soft x-ray reflectometry, hard x-ray photoelectron spectroscopy and transmission electron microscopy investigations of the internal structure of TiO2(Ti)/SiO2/Si stacks
We developed a mathematical analysis method of reflectometry data and used it to characterize the internal structure of TiO2/SiO2/Si and Ti/SiO2/Si stacks. Atomic concentration profiles of all the chemical elements composing the samples were reconstructed from the analysis of the reflectivity curves...
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Format: | Article |
Language: | English |
Published: |
Taylor & Francis Group
2012-01-01
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Series: | Science and Technology of Advanced Materials |
Online Access: | http://iopscience.iop.org/1468-6996/13/1/015001 |