Design and analysis of IGZO thin film transistor for AMOLED pixel circuit using double-gate tri active layer channel

In this research work, Amorphous Indium–Gallium–Zinc–Oxide (α-IGZO) thin-film transistor consisting of Tri-Active Layer (TAL) channel have been designed in a double-gate structure. The electrical performance of the novel device structure has been analyzed with its output and transfer characteristics...

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Bibliographic Details
Main Authors: Shashi K. Dargar, Viranjay M. Srivastava
Format: Article
Language:English
Published: Elsevier 2019-04-01
Series:Heliyon
Subjects:
Online Access:http://www.sciencedirect.com/science/article/pii/S2405844018380812