Nanostructured antidiffusion layers in contacts to wide-gap semiconductors
The interrelation between the antidiffusion properties of titanium diboride films and their nanocrystalline structure is investigated. We made a valid assumption that the main reason for degradation of contacts with TiB2-based diffusion layers is diffusion through the TiB2 film through dislocations...
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| Format: | Article |
| Language: | English |
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Politehperiodika
2013-12-01
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| Series: | Tekhnologiya i Konstruirovanie v Elektronnoi Apparature |
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| Online Access: | http://www.tkea.com.ua/tkea/2013/6_2013/pdf/01.zip |