Effect of Thermal Stresses Formed during Air Annealing of Amorphous Lanthanum Cuprate Thin Films Deposited on Silicon Substrate

Amorphous thin films of La–Cu–O deposited by magnetron sputtering have been annealed at different temperatures and in situ analyzed by X-ray diffraction. These experiments were useful to determine the crystallization temperature and to follow the crystallization process of the film. The in situ anne...

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Bibliographic Details
Main Authors: Nolwenn Tranvouez, Philippe Steyer, Annie Malchère, Pascal Boulet, Fabien Capon, Jean-Philippe Bauer, Jean-François Pierson
Format: Article
Language:English
Published: MDPI AG 2020-06-01
Series:Coatings
Subjects:
Online Access:https://www.mdpi.com/2079-6412/10/7/613