Microstructure and scratch analysis of aluminium thin films sputtered at varying RF power on stainless steel substrates
Aluminium (Al) thin films (thickness ranging between 500 and 600 nm) were deposited on stainless-steel substrates at varying radio-frequency (RF) power by magnetron sputtering at a constant substrate temperature of 90°C. Characterisations were undertaken by field emission scanning electron microscop...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Taylor & Francis Group
2020-01-01
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| Series: | Cogent Engineering |
| Subjects: | |
| Online Access: | http://dx.doi.org/10.1080/23311916.2020.1765687 |