Rear surface passivation of ultra-thin CIGS solar cells using atomic layer deposited HfOx

Rear surface passivation of ultra-thin CIGS solar cells using atomic layer deposited HfOx

In this work, hafnium oxide layer is investigated as rear surface passivation layer for ultra-thin (550 nm) CIGS solar cells. Point contact openings in the passivation layer are realized by spin-coating potassium fluoride prior to absorber layer growth. Contacts are formed during absorber layer grow...

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Bibliographic Details
Main Authors: Birant Gizem, Mafalda Jorge, Scaffidi Romain, de Wild Jessica, Buldu Dilara Gokcen, Kohl Thierry, Brammertz Guy, Meuris Marc, Poortmans Jef, Vermang Bart
Format: Article
Language:English
Published: EDP Sciences 2020-01-01
Series:EPJ Photovoltaics
Subjects:
solar cells
ultra-thin films
copper indium gallium selenide
surface passivation layer
hafnium oxide
Online Access:https://www.epj-pv.org/articles/epjpv/full_html/2020/01/pv200010/pv200010.html

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https://www.epj-pv.org/articles/epjpv/full_html/2020/01/pv200010/pv200010.html

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