Lithography-Free Fabrication of Large Area Subwavelength Antireflection Structures Using Thermally Dewetted Pt/Pd Alloy Etch Mask

Lithography-Free Fabrication of Large Area Subwavelength Antireflection Structures Using Thermally Dewetted Pt/Pd Alloy Etch Mask

<p>Abstract</p> <p>We have demonstrated lithography-free, simple, and large area fabrication method for subwavelength antireflection structures (SAS) to achieve low reflectance of silicon (Si) surface. Thin film of Pt/Pd alloy on a Si substrate is melted and agglomerated into hemis...

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Bibliographic Details
Main Authors: Kang Jeong-Jin, Lee Youngjae, Koh Kisik, Na Hyungjoo, Kim Kwanoh, Kim Jongbaeg
Format: Article
Language:English
Published: SpringerOpen 2009-01-01
Series:Nanoscale Research Letters
Subjects:
Subwavelength antireflection structure
Nanostructure
Thermal dewetting
Self-agglomeration
Online Access:http://dx.doi.org/10.1007/s11671-009-9255-4

Internet

http://dx.doi.org/10.1007/s11671-009-9255-4

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