Purity of Ion Beams: Analysis and Simulation of Mass Spectra and Mass Interferences in Ion Implantation

This paper shows that charge exchange events and dissociation reactions of ions may impact the purity of the ion beam in ion implantation, leading to contamination of the implanted target. Physical relations are derived that explain why unwanted ions are transported in the ion beam despite of a magn...

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Bibliographic Details
Main Authors: Volker Häublein, Heiner Ryssel, Lothar Frey
Format: Article
Language:English
Published: Hindawi Limited 2012-01-01
Series:Advances in Materials Science and Engineering
Online Access:http://dx.doi.org/10.1155/2012/610150