Influence of oxygen partial pressure on the microstructural and magnetic properties of Er-doped ZnO thin films

Er-doped ZnO thin films have been prepared by using inductively coupled plasma enhanced physical vapor deposition at different O2:Ar gas flow ratio (R = 0:30, 1:30, 1:15, 1:10 and 1:6). The influence of oxygen partial pressure on the structural, optical and magnetic properties was studied. It is fou...

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Bibliographic Details
Main Authors: Wei-Bin Chen, Xue-Chao Liu, Fei Li, Hong-Ming Chen, Ren-Wei Zhou, Er-Wei Shi
Format: Article
Language:English
Published: AIP Publishing LLC 2015-06-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/1.4922141