High-Performance Deep Ultraviolet Photodetector Based on NiO/β-Ga2O3 Heterojunction

Abstract Ultraviolet (UV) photodetector has attracted extensive interests due to its wide-ranging applications from defense technology to optical communications. The use of wide bandgap metal oxide semiconductor materials is of great interest in the development of UV photodetector due to their uniqu...

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Main Authors: Menghan Jia, Fang Wang, Libin Tang, Jinzhong Xiang, Kar Seng Teng, Shu Ping Lau
Format: Article
Language:English
Published: SpringerOpen 2020-02-01
Series:Nanoscale Research Letters
Subjects:
NiO
Online Access:http://link.springer.com/article/10.1186/s11671-020-3271-9
id doaj-be6efa444e324528ad9f0ec59af389e9
record_format Article
spelling doaj-be6efa444e324528ad9f0ec59af389e92020-11-25T02:18:35ZengSpringerOpenNanoscale Research Letters1931-75731556-276X2020-02-011511610.1186/s11671-020-3271-9High-Performance Deep Ultraviolet Photodetector Based on NiO/β-Ga2O3 HeterojunctionMenghan Jia0Fang Wang1Libin Tang2Jinzhong Xiang3Kar Seng Teng4Shu Ping Lau5School of Materials Science and Engineering, Yunnan UniversitySchool of Materials Science and Engineering, Yunnan UniversityKunming Institute of PhysicsSchool of Physics and Astronomy, Yunnan UniversityCollege of Engineering, Swansea UniversityDepartment of Applied Physics, The Hong Kong Polytechnic UniversityAbstract Ultraviolet (UV) photodetector has attracted extensive interests due to its wide-ranging applications from defense technology to optical communications. The use of wide bandgap metal oxide semiconductor materials is of great interest in the development of UV photodetector due to their unique electronic and optical properties. In this work, deep UV photodetector based on NiO/β-Ga2O3 heterojunction was developed and investigated. The β-Ga2O3 layer was prepared by magnetron sputtering and exhibited selective orientation along the family of ( 2¯ $$ \overline{2} $$ 01) crystal plane after annealing. The photodetector demonstrated good performance with a high responsivity (R) of 27.43 AW−1 under a 245-nm illumination (27 μWcm−2) and the maximum detectivity (D*) of 3.14 × 1012 cmHz1/2 W−1, which was attributed to the p-NiO/n-β-Ga2O3 heterojunction.http://link.springer.com/article/10.1186/s11671-020-3271-9β-Ga2O3NiOHeterojunctionUV photodetector
collection DOAJ
language English
format Article
sources DOAJ
author Menghan Jia
Fang Wang
Libin Tang
Jinzhong Xiang
Kar Seng Teng
Shu Ping Lau
spellingShingle Menghan Jia
Fang Wang
Libin Tang
Jinzhong Xiang
Kar Seng Teng
Shu Ping Lau
High-Performance Deep Ultraviolet Photodetector Based on NiO/β-Ga2O3 Heterojunction
Nanoscale Research Letters
β-Ga2O3
NiO
Heterojunction
UV photodetector
author_facet Menghan Jia
Fang Wang
Libin Tang
Jinzhong Xiang
Kar Seng Teng
Shu Ping Lau
author_sort Menghan Jia
title High-Performance Deep Ultraviolet Photodetector Based on NiO/β-Ga2O3 Heterojunction
title_short High-Performance Deep Ultraviolet Photodetector Based on NiO/β-Ga2O3 Heterojunction
title_full High-Performance Deep Ultraviolet Photodetector Based on NiO/β-Ga2O3 Heterojunction
title_fullStr High-Performance Deep Ultraviolet Photodetector Based on NiO/β-Ga2O3 Heterojunction
title_full_unstemmed High-Performance Deep Ultraviolet Photodetector Based on NiO/β-Ga2O3 Heterojunction
title_sort high-performance deep ultraviolet photodetector based on nio/β-ga2o3 heterojunction
publisher SpringerOpen
series Nanoscale Research Letters
issn 1931-7573
1556-276X
publishDate 2020-02-01
description Abstract Ultraviolet (UV) photodetector has attracted extensive interests due to its wide-ranging applications from defense technology to optical communications. The use of wide bandgap metal oxide semiconductor materials is of great interest in the development of UV photodetector due to their unique electronic and optical properties. In this work, deep UV photodetector based on NiO/β-Ga2O3 heterojunction was developed and investigated. The β-Ga2O3 layer was prepared by magnetron sputtering and exhibited selective orientation along the family of ( 2¯ $$ \overline{2} $$ 01) crystal plane after annealing. The photodetector demonstrated good performance with a high responsivity (R) of 27.43 AW−1 under a 245-nm illumination (27 μWcm−2) and the maximum detectivity (D*) of 3.14 × 1012 cmHz1/2 W−1, which was attributed to the p-NiO/n-β-Ga2O3 heterojunction.
topic β-Ga2O3
NiO
Heterojunction
UV photodetector
url http://link.springer.com/article/10.1186/s11671-020-3271-9
work_keys_str_mv AT menghanjia highperformancedeepultravioletphotodetectorbasedonniobga2o3heterojunction
AT fangwang highperformancedeepultravioletphotodetectorbasedonniobga2o3heterojunction
AT libintang highperformancedeepultravioletphotodetectorbasedonniobga2o3heterojunction
AT jinzhongxiang highperformancedeepultravioletphotodetectorbasedonniobga2o3heterojunction
AT karsengteng highperformancedeepultravioletphotodetectorbasedonniobga2o3heterojunction
AT shupinglau highperformancedeepultravioletphotodetectorbasedonniobga2o3heterojunction
_version_ 1724881193684434944