The investigation of the diameter dimension effect on the Si nano-tube transistors
The vertical gate-all-around (V-GAA) Si nano-tube (NT) devices with different diameter dimensions are studied in this work with the promising device performance. The V-GAA structure makes the transistor easy to be scaled down continuously to meet the complementary metal-oxide-semiconductor (CMOS) sc...
| Main Authors: | , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2016-03-01
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| Series: | AIP Advances |
| Online Access: | http://dx.doi.org/10.1063/1.4945346 |