Freestanding ultra-thin silica
Silica (SiOx) thin films are promising for a wide range of applications, including catalysis, separation technology, biomedicine, or transparent super-hydrophilic films. Here, we present a study demonstrating a unique way of producing ultra-thin, freestanding silica films via silicon etching. This m...
| Main Authors: | , , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2020-02-01
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| Series: | AIP Advances |
| Online Access: | http://dx.doi.org/10.1063/1.5136232 |