Growth of Si-doped AlN on sapphire (0001) via pulsed sputtering

• Main Authors: Yuya Sakurai, Kohei Ueno, Atsushi Kobayashi, Jitsuo Ohta, Hideto Miyake, Hiroshi Fujioka
• Format: Article
• Language: English
• Published: AIP Publishing LLC 2018-11-01
• Series: APL Materials
• Online Access: http://dx.doi.org/10.1063/1.5051555

The Si-doped AlN films were grown on sapphire (0001) by pulsed sputtering deposition (PSD), and their structural and electrical properties were investigated. A combination of PSD and high-temperature annealing process enabled the growth of high-quality AlN (0001) epitaxial films on sapphire (0001) substrates with atomically flat stepped and terraced surfaces. The transmission electron microscopy observations revealed that the majority of the threading dislocations in AlN belonged to the mixed- or edge-type, with densities of 2.8 × 108 and 4.4 × 109 cm−2, respectively. The Si-doping of AlN by PSD yielded a clear n-type conductivity with a maximum electron mobility of 44 cm2 V−1 s−1, which was the highest value reported for AlN that was grown on sapphire. These results clearly demonstrated the strong potential of the PSD technique for growing high-quality conductive n-type AlN on sapphire.