Pollution-Free Approaches for Highly Efficient Sapphire Substrate Processing by Mechanical Chemical Polishing
In this study, two pollution-free approaches were used to improve the processing efficiency of mechanical chemical polishing (MCP) for sapphire substrates. The first was dedicated to polishing using synthetic silica abrasives with high reactivity as soft abrasives, and the second was dedicated to po...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2019-07-01
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| Series: | Catalysts |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2073-4344/9/7/594 |