Crystallization of PECVD-deposited Amorphous Silicon Thin Films Using the Aluminum-induced Crystallization Technique
The investigation of polycrystalline silicon made on glass and carbon coated nickel substrates by aluminum-induced crystallization of amorphous silicon (a-Si) is reported. Aluminum was sputtered onto a-Si films deposited in an ultra-high-vacuum plasma-enhanced chemical vapor deposition (PECVD) syste...
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| Format: | Article |
| Language: | English |
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Elsevier
2003-01-01
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| Series: | Journal of King Saud University: Engineering Sciences |
| Online Access: | http://www.sciencedirect.com/science/article/pii/S1018363918307736 |