Negative differential resistance in Si/GaAs tunnel junction formed by single crystalline nanomembrane transfer method

Negative differential resistance (NDR) region was established in Si/GaAs tunnel junction (TJ) formed by single crystalline nanomembrane (NM) transfer method. P + Si NM was transfer-printed onto n + GaAs epi-wafer, leading to the formation of Si/GaAs pn TJ diode comprised of crystalline semiconductor...

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Bibliographic Details
Main Authors: Kwangeun Kim, Jaewon Jang, Hyungtak Kim
Format: Article
Language:English
Published: Elsevier 2021-06-01
Series:Results in Physics
Subjects:
Si
Online Access:http://www.sciencedirect.com/science/article/pii/S2211379721004150