Microstructure and Mechanical Properties of TaN Thin Films Prepared by Reactive Magnetron Sputtering
Reactive magnetron sputtering was used to deposit tantalum nitride (Ta–N) thin films on Si substrate. The effect of varying the N2 percentage in the N2/Ar gas mixture on the Ta–N film characteristics was investigated. Mechanical and tribological properties were studied using nanoindentation and pin-...
| Main Authors: | , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2017-11-01
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| Series: | Coatings |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2079-6412/7/12/209 |