Hybrid chemical etching of femtosecond irradiated 3D structures in fused silica glass
We report on the fabrication of 3D micro-structures in fused silica glass using chemical etching along femtosecond laser irradiated zones. In particular, we exploited a novel approach combining two different etching agents in successive steps: the hydrofluoric acid, which provides fast volume remova...
| Main Authors: | , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
EDP Sciences
2013-11-01
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| Series: | MATEC Web of Conferences |
| Online Access: | http://dx.doi.org/10.1051/matecconf/20130805009 |