Airborne PM2.5 characteristics in semiconductor manufacturing facilities

Airborne PM2.5 characteristics in semiconductor manufacturing facilities

This study aimed to elucidate the concentrations and physicochemical properties of airborne PM2.5 during the normal operation of process equipment and scrubber in semiconductor manufacturing facilities, including the clean room (CR), plenum, clean sub fab (CSF), and facility sub fab (FSF). Number an...

Full description

Bibliographic Details
Main Author: Kwang-Min Choi
Format: Article
Language:English
Published: AIMS Press 2018-07-01
Series:AIMS Environmental Science
Subjects:
particulate matter
concentration
elemental component
size
morphology
semiconductor fabrication environment
Online Access:http://www.aimspress.com/environmental/article/2986/fulltext.html

Internet

http://www.aimspress.com/environmental/article/2986/fulltext.html

Similar Items