Convergence Of Iterative Solvers For Non-Linear Step-And-Flash Imprint Lithography Simulations
The paper presents the analysis of the iterative solvers utilized to solve the non-linear problemof Step-and-Flash Imprint Lithography (SFIL) a modern patterning process. The simulationsconsists in solving molecular statics problem for the polymer network, with quadratic potentials.The model disting...
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| Format: | Article |
| Language: | English |
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AGH University of Science and Technology Press
2011-01-01
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| Series: | Computer Science |
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| Online Access: | http://journals.agh.edu.pl/csci/article/download/101/47 |