High-Performance LPCVD-SiN<sub>x</sub>/InAlGaN/GaN MIS-HEMTs With 850-V 0.98-<inline-formula> <tex-math notation="LaTeX">$\text{m}{\Omega} \cdot$ </tex-math></inline-formula>cm<sup>2</sup> for Power Device Applications

We demonstrate the electrical performances of the quaternary InAlGaN/GaN MIS-HEMTs with high quality SiNx gate dielectric and surface passivation layer deposited by low pressure chemical vapor deposition (LPCVD) at 780 &#x00B0;C. Excellent LPCVD-SiNx/InAlGaN interface and SiNx film quality were...

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Bibliographic Details
Main Authors: Huan-Chung Wang, Franky Juanda Lumbantoruan, Ting-En Hsieh, Chia-Hsun Wu, Yueh-Chin Lin, Edward Yi Chang
Format: Article
Language:English
Published: IEEE 2018-01-01
Series:IEEE Journal of the Electron Devices Society
Subjects:
Online Access:https://ieeexplore.ieee.org/document/8462727/