Erbium-Doped Amorphous Carbon-Based Thin Films: A Photonic Material Prepared by Low-Temperature RF-PEMOCVD
The integration of photonic materials into CMOS processing involves the use of new materials. A simple one-step metal-organic radio frequency plasma enhanced chemical vapor deposition system (RF-PEMOCVD) was deployed to grow erbium-doped amorphous carbon thin films (a-C:(Er)) on Si substrates at low...
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doaj-d4f7d159efa34013bf010b56cbb391192020-11-24T22:57:47ZengMDPI AGMaterials1996-19442014-02-01731539155410.3390/ma7031539ma7031539Erbium-Doped Amorphous Carbon-Based Thin Films: A Photonic Material Prepared by Low-Temperature RF-PEMOCVDHui-Lin Hsu0Keith R. Leong1I-Ju Teng2Michael Halamicek3Jenh-Yih Juang4Sheng-Rui Jian5Li Qian6Nazir P. Kherani7Department of Electrical and Computer Engineering, University of Toronto, Toronto, ON M5S 3G4, CanadaDepartment of Electrical and Computer Engineering, University of Toronto, Toronto, ON M5S 3G4, CanadaCentre for Interdisciplinary Science, National Chiao Tung University, Hsinchu 30010, TaiwanDepartment of Electrical and Computer Engineering, University of Toronto, Toronto, ON M5S 3G4, CanadaCentre for Interdisciplinary Science, National Chiao Tung University, Hsinchu 30010, TaiwanDepartment of Materials Science and Engineering, I-Shou University, Kaohsiung 84001, TaiwanDepartment of Electrical and Computer Engineering, University of Toronto, Toronto, ON M5S 3G4, CanadaDepartment of Electrical and Computer Engineering, University of Toronto, Toronto, ON M5S 3G4, CanadaThe integration of photonic materials into CMOS processing involves the use of new materials. A simple one-step metal-organic radio frequency plasma enhanced chemical vapor deposition system (RF-PEMOCVD) was deployed to grow erbium-doped amorphous carbon thin films (a-C:(Er)) on Si substrates at low temperatures (<200 °C). A partially fluorinated metal-organic compound, tris(6,6,7,7,8,8,8-heptafluoro-2,2-dimethyl-3,5- octanedionate) Erbium(+III) or abbreviated Er(fod)3, was incorporated in situ into a-C based host. Six-fold enhancement of Er room-temperature photoluminescence at 1.54 µm was demonstrated by deuteration of the a-C host. Furthermore, the effect of RF power and substrate temperature on the photoluminescence of a-C:D(Er) films was investigated and analyzed in terms of the film structure. Photoluminescence signal increases with increasing RF power, which is the result of an increase in [O]/[Er] ratio and the respective erbium-oxygen coordination number. Moreover, photoluminescence intensity decreases with increasing substrate temperature, which is attributed to an increased desorption rate or a lower sticking coefficient of the fluorinated fragments during film growth and hence [Er] decreases. In addition, it is observed that Er concentration quenching begins at ~2.2 at% and continues to increase until 5.5 at% in the studied a-C:D(Er) matrix. This technique provides the capability of doping Er in a vertically uniform profile.http://www.mdpi.com/1996-1944/7/3/1539RF-PEMOCVDerbium metal-organic compounddeuterated amorphous carbon (a-C:D)fluorination |
collection |
DOAJ |
language |
English |
format |
Article |
sources |
DOAJ |
author |
Hui-Lin Hsu Keith R. Leong I-Ju Teng Michael Halamicek Jenh-Yih Juang Sheng-Rui Jian Li Qian Nazir P. Kherani |
spellingShingle |
Hui-Lin Hsu Keith R. Leong I-Ju Teng Michael Halamicek Jenh-Yih Juang Sheng-Rui Jian Li Qian Nazir P. Kherani Erbium-Doped Amorphous Carbon-Based Thin Films: A Photonic Material Prepared by Low-Temperature RF-PEMOCVD Materials RF-PEMOCVD erbium metal-organic compound deuterated amorphous carbon (a-C:D) fluorination |
author_facet |
Hui-Lin Hsu Keith R. Leong I-Ju Teng Michael Halamicek Jenh-Yih Juang Sheng-Rui Jian Li Qian Nazir P. Kherani |
author_sort |
Hui-Lin Hsu |
title |
Erbium-Doped Amorphous Carbon-Based Thin Films: A Photonic Material Prepared by Low-Temperature RF-PEMOCVD |
title_short |
Erbium-Doped Amorphous Carbon-Based Thin Films: A Photonic Material Prepared by Low-Temperature RF-PEMOCVD |
title_full |
Erbium-Doped Amorphous Carbon-Based Thin Films: A Photonic Material Prepared by Low-Temperature RF-PEMOCVD |
title_fullStr |
Erbium-Doped Amorphous Carbon-Based Thin Films: A Photonic Material Prepared by Low-Temperature RF-PEMOCVD |
title_full_unstemmed |
Erbium-Doped Amorphous Carbon-Based Thin Films: A Photonic Material Prepared by Low-Temperature RF-PEMOCVD |
title_sort |
erbium-doped amorphous carbon-based thin films: a photonic material prepared by low-temperature rf-pemocvd |
publisher |
MDPI AG |
series |
Materials |
issn |
1996-1944 |
publishDate |
2014-02-01 |
description |
The integration of photonic materials into CMOS processing involves the use of new materials. A simple one-step metal-organic radio frequency plasma enhanced chemical vapor deposition system (RF-PEMOCVD) was deployed to grow erbium-doped amorphous carbon thin films (a-C:(Er)) on Si substrates at low temperatures (<200 °C). A partially fluorinated metal-organic compound, tris(6,6,7,7,8,8,8-heptafluoro-2,2-dimethyl-3,5- octanedionate) Erbium(+III) or abbreviated Er(fod)3, was incorporated in situ into a-C based host. Six-fold enhancement of Er room-temperature photoluminescence at 1.54 µm was demonstrated by deuteration of the a-C host. Furthermore, the effect of RF power and substrate temperature on the photoluminescence of a-C:D(Er) films was investigated and analyzed in terms of the film structure. Photoluminescence signal increases with increasing RF power, which is the result of an increase in [O]/[Er] ratio and the respective erbium-oxygen coordination number. Moreover, photoluminescence intensity decreases with increasing substrate temperature, which is attributed to an increased desorption rate or a lower sticking coefficient of the fluorinated fragments during film growth and hence [Er] decreases. In addition, it is observed that Er concentration quenching begins at ~2.2 at% and continues to increase until 5.5 at% in the studied a-C:D(Er) matrix. This technique provides the capability of doping Er in a vertically uniform profile. |
topic |
RF-PEMOCVD erbium metal-organic compound deuterated amorphous carbon (a-C:D) fluorination |
url |
http://www.mdpi.com/1996-1944/7/3/1539 |
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