Adaptive Step-Size Control in Simulation of Diffusive CVD Processes
We present control strategies of a diffusion process for chemical vapor deposition for metallic bipolar plates. In the models, we discuss the application of different models to simulate the plasma-transport of chemical reactants in the gas-chamber. The contribution are an optimal control problem bas...
| Main Authors: | , |
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| Format: | Article |
| Language: | English |
| Published: |
Hindawi Limited
2009-01-01
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| Series: | Mathematical Problems in Engineering |
| Online Access: | http://dx.doi.org/10.1155/2009/728105 |