Improvement in Bias Stability of IGZO TFT With Etching Stop Structure by UV Irradiation Treatment of Active Layer Island
In this paper, the effect of ultraviolet (UV) irradiation treatment of active layer IGZO on the bias stability of amorphous IGZO thin film transistor with etch stop (ES) structure is studied. Along with the increase in UV irradiation time, the surface of the IGZO film becomes smoother. An appropriat...
| Main Authors: | , , , , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
IEEE
2020-01-01
|
| Series: | IEEE Journal of the Electron Devices Society |
| Subjects: | |
| Online Access: | https://ieeexplore.ieee.org/document/9079913/ |