Enhanced Virtual Metrology on Chemical Mechanical Planarization Process using an Integrated Model and Data-Driven Approach
As an essential process in semiconductor manufacturing, Chemical Mechanical Planarization has been studied in recent decades and the material removal rate has been proved to be a critical performance indicator. Comparing with after-process metrology, virtual metrology shows advantages in production...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
The Prognostics and Health Management Society
2017-06-01
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| Series: | International Journal of Prognostics and Health Management |
| Subjects: | |
| Online Access: | https://papers.phmsociety.org/index.php/ijphm/article/view/2641 |