Surface passivation and optical characterization of Al2O3/a-SiCx stacks on c-Si substrates

Surface passivation and optical characterization of Al2O3/a-SiCx stacks on c-Si substrates

The aim of this work is to study the surface passivation of aluminum oxide/amorphous silicon carbide (Al2O3/a-SiCx) stacks on both p-type and n-type crystalline silicon (c-Si) substrates as well as the optical characterization of these stacks. Al2O3 films of different thicknesses were deposited by t...

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Bibliographic Details
Main Authors: Gema López, Pablo R. Ortega, Cristóbal Voz, Isidro Martín, Mónica Colina, Anna B. Morales, Albert Orpella, Ramón Alcubilla
Format: Article
Language:English
Published: Beilstein-Institut 2013-11-01
Series:Beilstein Journal of Nanotechnology
Subjects:
aluminum oxide (Al2O3)
antireflection coating
atomic layer deposition
silicon carbide (SiCx)
surface passivation
Online Access:https://doi.org/10.3762/bjnano.4.82

Internet

https://doi.org/10.3762/bjnano.4.82

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