Interferometric Scheme for High-Sensitivity Coaxial Focusing in Projection Lithography
Focusing of wafer plane is an essential factor to determine the ultimate feature size of the stepper such as projection lithographic system. Based on Michelson interferometeric system, this paper demonstrates an interferometric focusing scheme for projection lithography to coaxially locate the ideal...
| Main Authors: | , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
IEEE
2014-01-01
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| Series: | IEEE Photonics Journal |
| Subjects: | |
| Online Access: | https://ieeexplore.ieee.org/document/6820728/ |